Optimization of the MoS x Pulsed Laser Deposition of Thin-Film Catalyst for Efficient Hydrogen Evolution Reaction on a Silicon Photocathod | Fominski | Nuclear Physics and Engineering

Nuclear Physics and Engineering
Âdernaâ fizika i inžiniring

ISSN 2079-5629 (Print)
ISSN 2079-5637 (Online)

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Fominski D.V., Romanov R.I., Rubinkovskaya O.V., Nevolin V.N., Fominski V.Yu. Optimization of the MoS_x Pulsed Laser Deposition of Thin-Film Catalyst for Efficient Hydrogen Evolution Reaction on a Silicon Photocathod. Nuclear Physics and Engineering. 2023;14(4):330-334. (In Russ.) https://doi.org/10.56304/S2079562922050141

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ISSN 2079-5629 (Print)
ISSN 2079-5637 (Online)

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About the Authors

D. V. Fominski
National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)
Russian Federation

Moscow, 115409

R. I. Romanov
National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)
Russian Federation

Moscow, 115409

O. V. Rubinkovskaya
National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)
Russian Federation

Moscow, 115409

V. N. Nevolin
National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)
Russian Federation

Moscow, 115409

V. Yu. Fominski
National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)
Russian Federation

Moscow, 115409

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