<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">npe</journal-id><journal-title-group><journal-title xml:lang="ru">Ядерная физика и инжиниринг</journal-title><trans-title-group xml:lang="en"><trans-title>Nuclear Physics and Engineering</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2079-5629</issn><issn pub-type="epub">2079-5637</issn><publisher><publisher-name>МИФИ</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.56304/S2079562922050529</article-id><article-id custom-type="elpub" pub-id-type="custom">npe-180</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Ускорители заряженных частиц для ядерных технологий</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>Charged Particles Accelerators for Nuclear Technologies</subject></subj-group></article-categories><title-group><article-title>Диффузионная модель для описания релаксационного процесса в обедненном электронами полупроводниковом слое фотокатода</article-title><trans-title-group xml:lang="en"><trans-title>A Diffusion Model for Describing Relaxation Process in the Semiconductor Electron Depleted Layer of a Photocathode</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Владимиров</surname><given-names>М. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Vladimirov</surname><given-names>M. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Москва, 115409</p></bio><bio xml:lang="en"><p>Moscow, 115409</p></bio><email xlink:type="simple">MVVladimirov@mephi.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Полозов</surname><given-names>С. М.</given-names></name><name name-style="western" xml:lang="en"><surname>Polozov</surname><given-names>S. M.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Москва, 115409</p></bio><bio xml:lang="en"><p>Moscow, 115409</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ращиков</surname><given-names>В. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Rashchikov</surname><given-names>V. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Москва, 115409</p></bio><bio xml:lang="en"><p>Moscow, 115409</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Национальный исследовательский ядерный университет “МИФИ”</institution><country>Россия</country></aff><aff xml:lang="en"><institution>National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>31</day><month>12</month><year>2023</year></pub-date><volume>14</volume><issue>4</issue><fpage>389</fpage><lpage>393</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Владимиров М.В., Полозов С.М., Ращиков В.И., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Владимиров М.В., Полозов С.М., Ращиков В.И.</copyright-holder><copyright-holder xml:lang="en">Vladimirov M.V., Polozov S.M., Rashchikov V.I.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://npe.elpub.ru/jour/article/view/180">https://npe.elpub.ru/jour/article/view/180</self-uri><abstract><p>В рамках построения модели фотоэмиссии пикосекундных электронных сгустков в присутствии сильного электромагнитного поля разработана диффузионная модель, позволяющая описывать заполнение электронами металлической подложки предварительно обедненного полупроводникового слоя фотокатода. С учетом и без учета внешнего электрического поля получены аналитические зависимости распределения концентрации электронов в полупроводниковом слое, а также временные зависимости заряда полупроводникового слоя. Показана принципиальная возможность определения времени релаксации – времени, за которое заряд полупроводникового слоя уменьшится до заданного уровня, – что является очередным шагом развития модели фотоэмиссии.</p></abstract><trans-abstract xml:lang="en"><p>To improve photoemission simulation model of picosecond electron bunches in a strong electromagnetic field, a diffusion model has been developed to describe the filling of a pre-depleted semiconductor layer of a photocathode with electrons from a metal substrate. With and without taking into account the external electric field, the analytical dependences of the distribution of the electron concentration in the semiconductor layer, as well as the time dependences of the charge of the semiconductor layer, are obtained. It is shown that it is possible in principle to determine the relaxation time, i.e., the time it takes for the charge of the semiconductor layer to decrease to a given level, which is the next step in the development of the photoemission model.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>фотокатод</kwd><kwd>электронные фотоинжекторы</kwd><kwd>диффузия</kwd><kwd>задача конвекции–диффузии</kwd></kwd-group><kwd-group xml:lang="en"><kwd>photocathode</kwd><kwd>electron photoinjectors</kwd><kwd>diffusion</kwd><kwd>convection-diffusion problem</kwd><kwd>drift-diffusion problem</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Работа выполнена в рамках проекта РФФИ № 19-29-12036.</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Teichert J. et al. Report on Photocathodes. CARE Report-05-028-PHIN. 2004. 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